Fabrication of Si/Si1-xGex waveguide WDM components

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3007, Issue , 1997, Pages 178-188

  Xu, Dan Xia ^a   Janz, Siegfried ^a   Williams, Robin L ^a   Allegretto, Elizabeth ^a   Mailhot, Sylvain ^a   He, Jian Jun ^a   Baribeau, Jean Marc ^a   Lafontaine, Hugues ^a   Stapledon, John ^a   Fraser, Jeffrey W ^a   Robillard, Mike R ^b   Jessop, Paul E ^b   Kovacic, Stephen ^c  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b MCMASTER UNIVERSITY   (Canada)

^c NORTEL NETWORKS   (Canada)

Author keywords

Heterostructure; Mode profile; Optical facets; Refractive index; Si; SiGe; Waveguide; WDM

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTROOPTICAL DEVICES; GERMANIUM; GROWTH (MATERIALS); LIGHT MEASUREMENT; LIGHT REFRACTION; OPTOELECTRONIC DEVICES; ORGANIC POLYMERS; REFRACTIVE INDEX; REFRACTOMETERS; SEMICONDUCTING GERMANIUM COMPOUNDS; SILICON; SILICON ALLOYS; WAVEGUIDES; WAVELENGTH DIVISION MULTIPLEXING; DESIGN; DIELECTRIC FILMS; FABRICATION; MANUFACTURE; MOLECULAR BEAM EPITAXY; SEMICONDUCTING SILICON;

HETEROSTRUCTURE; MODE PROFILE; OPTICAL FACETS; SI; SIGE; WAVEGUIDE; WDM; EPILAYERS; PSEUDOMORPHIC GROWTH;

SEMICONDUCTING SILICON COMPOUNDS; OPTICAL WAVEGUIDES;

EID: 0031380892     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.273852     Document Type: Conference Paper

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