Annealing of silica glasses implanted with high-energy copper ions

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7681-7685

  Nakao, Setsuo ^a   Miyagawa, Yoshiko ^a   Saitoh, Kazuo ^a   Ikeyama, Masami ^a   Niwa, Hiroaki ^a   Tanemura, Seita ^a   Miyagawa, Soji ^a   Tazawa, Masato ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Cu nanoparticle formation; High energy Cu ion implantation; Optical absorption measurements; Rutherford backscattering spectrometry (RBS); Silica glass substrate; Surface plasmon resonance absorption

Indexed keywords

ANNEALING; BAND STRUCTURE; FUSED SILICA; ION IMPLANTATION; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; THERMAL EFFECTS;

SURFACE PLASMON RESONANCE ABSORPTION;

NANOTECHNOLOGY;

EID: 0031368048     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7681     Document Type: Article

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