Characterization of co-sputtered Si/MgO films - A comparison with Si/SiO2 and Si/Al2O3 films

Nanostructured Materials

Volumn 8, Issue 8, 1997, Pages 1085-1092

  Koshizaki, Naoto ^a   Umehara, Hiroyuki ^a   Sasaki, Takeshi ^a   Oyama, Toshie ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; AMORPHOUS FILMS; AMORPHOUS SILICON; ANNEALING; CRYSTALLIZATION; DIFFUSION IN SOLIDS; FILM PREPARATION; MAGNESIA; PHOTOLUMINESCENCE; SILICA; SPUTTER DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CO SPUTTERING METHOD;

NANOSTRUCTURED MATERIALS;

EID: 0031365698     PISSN: 09659773     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0965-9773(98)00035-X     Document Type: Article

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