Effects of substrate modification on the growth and characteristics of MOCVD PZT

Integrated Ferroelectrics

Volumn 17, Issue 1-4, 1997, Pages 67-79

  Kim, Daesig ^a   Kim, Tae Young ^a   Chung, Ilsub ^a   Chung, Chee Won ^a   Lee, J S ^a  

^a Samsung Advanced Institute of Technology (SAIT)   (South Korea)

Author keywords

Electrode; MOCVD; Pt; PZT; RuO2

Indexed keywords

CERAMIC CAPACITORS; CRYSTAL MICROSTRUCTURE; ELECTRODES; FERROELECTRIC DEVICES; FERROELECTRIC MATERIALS; LEAD COMPOUNDS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; PLATINUM; RUTHENIUM COMPOUNDS; SUBSTRATES; THERMAL EFFECTS;

LEAD ZIRCONATE TITANATE; RUTHENIUM DIOXIDE;

DIELECTRIC FILMS;

EID: 0031363168     PISSN: 10584587     EISSN: None     Source Type: Journal    
DOI: 10.1080/10584589708012982     Document Type: Article

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