Amorphous SiC film formation on Si(100) using electron beam excitation

Applied Surface Science

Volumn 120, Issue 3-4, 1997, Pages 279-286

  Xu, Jiazhan ^a   Choyke, W J ^a   Yates Jr , John T ^a  

^a UNIVERSITY OF PITTSBURGH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; DECOMPOSITION; ELECTRON BEAMS; FILM GROWTH; HYDROGEN; LOW ENERGY ELECTRON DIFFRACTION; SILANES; SILICON CARBIDE; TEMPERATURE PROGRAMMED DESORPTION; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON BEAM EXCITATION; METHYLSILANE;

AMORPHOUS FILMS;

EID: 0031361857     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)00232-8     Document Type: Article

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