Optoelectronic properties of thin amorphous and micro-crystalline p-type films developed for amorphous silicon-based solar cells

Materials Research Society Symposium - Proceedings

Volumn 420, Issue , 1996, Pages 819-824

  Winz, K ^a   Rech, B ^a   Eickhoff, Th ^a   Beneking, C ^a   Fortmann, C M ^a   Hapke, P ^a   Wagner, H ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; SOLAR CELLS; THIN FILMS; ZINC OXIDE;

CRYSTALLINE VOLUME FRACTION; MICROCRYSTALLINE SILICON; OPTOELECTRONIC PROPERTY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TIN DIOXIDE;

AMORPHOUS SILICON;

EID: 0030413513     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-420-819     Document Type: Conference Paper

References (14)