Microphotonic devices fabricated by silicon micromachining techniques

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 12 SUPPL. B, 1997, Pages 7757-7762

  Di Fabrizio, Enzo ^a   Baciocchi, Marco ^a,b   Gentili, Massimo ^a   Grella, Luca ^a   Mastrogiacomo, Luigi ^a  

^a CNR   (Italy)

^b Gate Micro Technology srl   (Italy)

Author keywords

Electroplating; Ion milling; Micromachining; Proximity corrections; Reactive ion etching

Indexed keywords

DIFFRACTION GRATINGS; ELECTRON BEAM LITHOGRAPHY; ELECTROPLATING; LIGHT MODULATION; MICROELECTRONIC PROCESSING; MICROMACHINING; MILLING (MACHINING); MIRRORS; REACTIVE ION ETCHING; SILICON NITRIDE; SILICON WAFERS;

ION MILLING; MICROPHOTONIC DEVICES; PROXIMITY CORRECTIONS; SILICON MICROMACHINING TECHNIQUES;

INTEGRATED OPTOELECTRONICS;

EID: 0031345571     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.7757     Document Type: Article

References (9)

1. H. Jerman: Proc. SPIE 2639 (1995) 3.
2. J. B. Sampsell: J. Vac. Sci. Technol. B 12 (1994) 3242.
3. J. H. Smith, S. Montague and J. J. Sniegowsky: Proc. SPIE 2639 (1995) 64.
4. E. Di Fabrizio, L. Grella, M. Baciocchi, M. Gentili, D. Peschiaroli, L. Mastrogiacomo and R. Maggiora: Jpn. J. Appl. Phys. 35 (1996) 2855.
5. E. Di Fabrizio, M. Gentili, P. Morales, R. Pilloton, J. Mela, S. Santucci, A. Sese: Appl. Phys. Lett. 69 (1996) 3280.
6. J. W. Dini: Electrodeposition ed. (Noyes Publications, Park Ridge, New Jersey, 1993).
7. Lectures on Physics, ed., R. Feynman (Addison-Wesley Publishing Co., New York, 1964).
8. R. L. Bisplinghoff, J. W. Mar and T. H. H. Pan: Statics of Deformable Solids (Dover Publication, Inc., New York, 1990).
9. Herbert Goldstein: Classical Mechanics (Addison-Wesley Publishing Inc., New York, 1965).