In situ mass changes and stress measurements in Cu/Fe20Ni80 electrodeposited multilayers

Journal of the Electrochemical Society

Volumn 144, Issue 12, 1997, Pages

  Chassaing, E ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; IRON ALLOYS; MECHANICAL VARIABLES MEASUREMENT; MULTILAYERS; NANOSTRUCTURED MATERIALS; STRESSES; TENSILE PROPERTIES; THIN FILMS;

COMPRESSIVE STRESSES; DOUBLE QUARTZ CRYSTAL METHOD; MASS CHANGES; STRESS MEASUREMENT;

ELECTRODEPOSITION;

EID: 0031336596     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838149     Document Type: Article

References (26)

1. E. Klokholm and B. S. Berry, This Journal, 115, 823 (1968).
2. O. Thomas, P. Gergaud, S. Labat, L. Barrallier, A. Charai, C. Alfonso, B. Gilles, and A. Marty, J. Phys. IV, 6, C7, 125 (1996)
3. W. D. Nix, Met. Trans. A, 20A, 2217 (1989).
4. R. Weil, Plating, 1231 (1970).
5. R. Aberman, in Thin Films: Stresses and Mechanical Properties III, W. D. Nix, J. C. Bravman, E. Arzt, and L. Ben Freund, Editors, Vol. 239, p 25, MRS, Pittsburgh, PA (1992).
6. G. Sotirova, S. Sarnev, and S. Armyanov, Electrochim. Acta, 34, 1237 (1989).
7. C. A. Ross, Annu. Rev. Mater. Sci., 24, 159 (1994) and references cited therein.
8. P. Nallet, E. Chassaing, M. G. Walls, and M. J. Hvtch, J. Appl. Phys., 79 6884 (1996).
9. E. Chassaing, P. Nallet, and M. F. Trichet, J. Phys. IV, C7, 13 (1996).
10. E. Chassaing, P. Nallet, and M. F. Trichet, This Journal, 143, L98 (1996).
11. J.-P. Celis, K. Van Acker, K. Callewaert, and P. Van Houtte, ibid., 142, 70 (1995).
12. F. Czerwinski, Thin Solid Films, 280, 199 (1996).
13. S. A. Armyanov and G. S. Sotirova-Chakarova, in Magnetic Materials, Processes, and Devices. L. T. Romankiw and D. A. Herman, Jr., EDitors, PV 90-8, p. 145. The Electrochemical Society Proceedings Series, Pennington, NJ (1990).
14. K. Vu Quang, E. Chassaing, and M. Saurat, Electrodeposition Surf. Treat., 3, 205 (1975).
15. D. Van Heerden, E. Zolotoyabko, and D. Shechtman, J. Mater. Res., 11, 2825 (1996).
16. V. M. Fedosyuk and O. I. Kasyutich, Russ. J. Electrochem., 29, 782 (1993).
17. E. P. EerNisse, J. Appl. Phys., 43, 1330 (1972).
18. V.Tsionsky, L. Daikhin, and E. Gileadi, This Journal, 143, 2240 (1996).
19. G. T. Cheek and W. E. O'Grady, J. Electronal. Chem., 277, 341 (1990).
20. Y. Li and Y.-T. Cheng, This Journal, 143, 120 (1996).
21. CRC Handbook of Chemistry and Physics, R. C. Weast, Editor, Cleveland, OH (1969).
22. J.W. Chang, K. C. Lin, R. G. Schad, P. C. Andricacos, and L. T. Romankiw, in Magnetic Materials, Processes, and Devices, L. T. Romankiw and D. A. Herman, Jr., Editors, PV 92-10. p. 315, The Electrochemical Society Proceedings Series, Pennington, NJ (1992).
23. W. B. Pearson, in Handbook of Lattice Spacings and Structures of Metals, Pergamon Press, New York (1967).
24. G. S. Sotirova-Chakarova and S. A. Armyanov, This Journal, 137, 3551 (1990).
25. S. Armyanov and G. Sotirovachakarova, ibid., 139, 3454 (1992).
26. D. Boutard, P. Trocellier, P. Nalliet, and E. Chassaing, Workshop on Hydrogène et Matériaux Métalliques, Orsay, France (1997).