Conjugate optical-thermal models of back and front laser treatments of thin multilayer films

International Journal of Heat and Technology

Volumn 15, Issue 2, 1997, Pages 49-56

  Bianco, N ^a   Morrone, B ^a   Manca, O ^b  

^a UNIVERSITY OF NAPLES FEDERICO II   (Italy)

^b SECOND UNIVERSITY OF NAPLES   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY ABSORPTION; GLASS; HEAT TRANSFER; MATHEMATICAL MODELS; NEODYMIUM LASERS; NUMERICAL ANALYSIS; PULSED LASER APPLICATIONS; SUBSTRATES; THIN FILMS;

LASER TREATMENT; OPTICAL THERMAL MODELS;

MULTILAYERS;

EID: 0031317154     PISSN: 03928764     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)

1. Rykalin N., Uglov A., Zuev I. and Kokora A., Laser and Electron Beam Material Processing Handbook, MIR Publishers, Moscow (1988).
2. Shah R. K., Roshan H. Md., Sastri V. M. K. and Padmanabhan K. A., eds, Thermomechanical Aspect of Manufacturing and Material Processing, Hemisphere Publishing Corp., Washington, D. C. (1992).
3. Grigoropoulos C. P., Heat Transfer in Laser Processing of Thin Films. In Annual Review of Heat Transfer (Edited by C. L. Tien), Chap. 2. CRC Press, Boca Raton, Fl (1994).
4. Chen G. and Tien C. L., Thermally Induced Optical Nonlinearity During Transient Heating of Thin Films, ASME J. Heat Transfer, Vol. 24, pp. 311-316 (1994).
5. Mansuripur M., Connell G. A. N. and Goodman J. W., Laser-Induced Local Heating of Multilayers, Appl. Optics, Vol. 21, pp. 1106-1114 (1982).
6. Nakano S., Matsuoka T., Kiyama S., Kawata H., Nakamura N., Nakashima Y., Tsuda S., Nishiwaki H., Ohnishi M., Nagakoa I. and Kuwano Y., Laser Patterning Method for Integrated Type a-Si Solar Cell Submodules, Jap. J. Appl. Phys., Vol. 25, pp. 1936-1943 (1986).
7. Kant R., Laser-Induced Heating of Multilayered Medium Resting on a Half-Space: Part I-Stationary Source, ASME J. Appl. Mechanics, Vol. 55, pp. 93-97 (1988).
8. Shimizu K., Imai S., Sugiura O. and Matsumura M., Transient Temperature Profiles in Silicon Films during Pulsed Laser Annealing, Jap. J. Appl. Phys., Vol. 30, pp. 2664-2672 (1991).
9. Park H. K., Xu X., Grigoropoulos C. P., Do N., Klees L., Leung P. T. and Tam A. C., Temporal Profile of Optical Transmission Probe for Pulsed-Laser Heating of Amorphous Films, Appl. Phys. Lett., Vol. 61, pp. 749-751 (1992).
10. Park H. K., Xu X., Grigoropoulos C. P., Do N., Klees L., Leung P. T. and Tam A. C., Transient Optical Transmission Measurement in Excimer-Laser Irradiation of Amorphous Silicon Films, ASME J. Heat Transfer, Vol. 115, pp. 178-183 (1993).
11. Grigoropoulos C. P., Park H. K. and Xu X., Modeling of Pulsed Laser Irradiation of Thin Silicon Layers, Int. J. Heat Mass Transfer, Vol. 36, pp. 919-924 (1993).
12. Angelucci N., Bianco N. and Manca O., Thermal Transient Analysis of Thin Film Multilayers Heated by Pulsed Laser, Int. J. Heat Mass Transfer, Vol. 40, pp. 4487-4495 (1997).
13. Born M. and Wolf E., Principles of Optics (6th edition), Pergamon Press, Oxford, U.K. (1980)
14. Kiyama S., Hirono Y., Hosokawa H., Moriguchi T., Nakano S. and Osumi M., Temperature Distribution Analysis in Multi-layer Thin Film Structures by Laser Beam Irradiation, Jap. Soc. Precision Eng., Vol. 56, pp. 1500-1506 (1990).
15. Do N., Klees L., Leung P. T., Tong F., Leung W. P. and Tam A. C., Temperature Dependence of Optical Constants for Amorphous Silicon, Appl. Phys. Lett., Vol. 60, pp. 2186-2188 (1992).
16. Ong C. K., Tan H. S. and Sin E. H., Calculation of Melting Threshold Energies of Crystalline and Amorphous Materials due to Pulsed-laser Irradiation, Mater., Sci. Engrg., Vol. 79, pp. 79-85 (1986).