KrF-excimer-laser induced absorption in synthetic fused silica

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6785-6786

  Kamisugi, Naoyoshi ^b   Kuzuu, Nobu ^a   Ihara, Yoshinao ^b   Nakamura, Takayuki ^b  

^a UNIVERSITY OF FUKUI   (Japan)

^b Nippon Silica Glass Yamaguchi C   (Japan)

Author keywords

Excimer laser induced absorption; E center; KrF excimer laser; Optical materials; Synthetic fused silica

Indexed keywords

EXCIMER LASERS; FUSED SILICA; HYDROLYSIS; KRYPTON; OPTICAL MATERIALS; SYNTHESIS (CHEMICAL);

GAUSSIAN ABSORPTION BAND;

LIGHT ABSORPTION;

EID: 0031276726     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6785     Document Type: Article

References (10)

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