Micromachining in SOI

IEE Colloquium (Digest)

Volumn , Issue 81, 1997, Pages

  McNie, M E ^a   King, D O ^a   Ward, M C L ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRY ETCHING; MASKS; PHOTORESISTS; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

ADVANCED SILICON ETCH (ASE);

MICROMACHINING;

EID: 0031275394     PISSN: 09633308     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (3)

1. MCL Ward, D O King, M E McNie : "Small Micro-Inertial Sensors" IEE Colloquium on Silicon Fabricated Inertial Instruments, London, December 1996.
2. M. E. McNie, D. O. King, V Nayar, M. C. L. Ward, J S Burdess, C. Quinn, S. Blackstone : "Deep Dry Etching of SOI for Silicon Micromachined Structures", IEEE International SOI Conference, Yosemite. October 1997.
3. J Bhardwaj, H Ashraf : "Advanced Silicon Etching Using High Density Plasmas", Micromachining and Microfabrication Technology, SPIE Vol. 2639, Austin, October 1995.