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Volumn 33, Issue 24, 1997, Pages 2075-2077

Excess noise in polysilicon thin film transistors operated in kink regime

Author keywords

Impact ionisation; Polysilicon; Thin film transistors

Indexed keywords

BIPOLAR TRANSISTORS; CHARGE CARRIERS; ELECTRON TRANSPORT PROPERTIES; IONIZATION OF SOLIDS; MOSFET DEVICES; SEMICONDUCTING SILICON; SILICON ON INSULATOR TECHNOLOGY; SPURIOUS SIGNAL NOISE;

EID: 0031271956     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19971392     Document Type: Article
Times cited : (3)

References (11)
  • 1
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  • 2
    • 0030082864 scopus 로고    scopus 로고
    • Large 1/f noise in polysilicon TFT loads and its effects on the stability of SRAM cells
    • AOKI, M., HASHIMOTO, T., YAMANAKA, T., and NAGANO, T.: 'Large 1/f noise in polysilicon TFT loads and its effects on the stability of SRAM cells', Jpn. J. Appl Phys., 1996, 35, pp. 838-841
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    • Aoki, M.1    Hashimoto, T.2    Yamanaka, T.3    Nagano, T.4
  • 3
    • 36449009150 scopus 로고
    • Evidence of carrier number fluctuation as origin of 1/f noise in polycrystalline silicon thin film transistors
    • CORRADETTI, A., LEONI, R., CARLUCCIO, R., FORTUNATO, G., REITA, C., PLAIS, F., and PRIBAT, D.: 'Evidence of carrier number fluctuation as origin of 1/f noise in polycrystalline silicon thin film transistors', Appl. Phys. Lett., 1995, 67, pp. 1730-1732
    • (1995) Appl. Phys. Lett. , vol.67 , pp. 1730-1732
    • Corradetti, A.1    Leoni, R.2    Carluccio, R.3    Fortunato, G.4    Reita, C.5    Plais, F.6    Pribat, D.7
  • 4
    • 0031552814 scopus 로고    scopus 로고
    • Noise performances in polycrystalline silicon thin film transistors fabricated by excimer laser crystallization
    • CARLUCCIO, R., CORRADETTI, A., FORTUNATO, G. REITA, C., LEGAGNEUX, P., PLAIS, F., and PRIBAT, D.: 'Noise performances in polycrystalline silicon thin film transistors fabricated by excimer laser crystallization', Appl. Phys. Lett., 1997, 71, pp. 578-580
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 578-580
    • Carluccio, R.1    Corradetti, A.2    Fortunato, G.3    Reita, C.4    Legagneux, P.5    Plais, F.6    Pribat, D.7
  • 6
    • 0016574231 scopus 로고
    • Properties of ESFI-MOS transistors due to the floating substrate and finite volume
    • TIHANI, J., and SCHLOTTERER, H.: 'Properties of ESFI-MOS transistors due to the floating substrate and finite volume', IEEE Trans. Electron Dev., 1975, ED-22, pp. 1017-1023
    • (1975) IEEE Trans. Electron Dev. , vol.ED-22 , pp. 1017-1023
    • Tihani, J.1    Schlotterer, H.2
  • 9
    • 0017544748 scopus 로고
    • Current-kink noise of n-channel enhancement ESFI-MOS SOS transistors
    • FICHTNER, W., and HOCHMAIR, E.: 'Current-kink noise of n-channel enhancement ESFI-MOS SOS transistors', Electron. Lett., 1977, 13, pp. 675-676
    • (1977) Electron. Lett. , vol.13 , pp. 675-676
    • Fichtner, W.1    Hochmair, E.2
  • 10
    • 0028397668 scopus 로고
    • The kink-related excess low-frequency noise in silicon-on-insulator MOST's
    • SIMOEN, E., MAGNUSSON, U., ROTONDARO, A.L.P., and CLAEYS, C.: 'The kink-related excess low-frequency noise in silicon-on-insulator MOST's', IEEE Trans. Electron. Dev., 1994, ED-41, pp. 330-339
    • (1994) IEEE Trans. Electron. Dev. , vol.ED-41 , pp. 330-339
    • Simoen, E.1    Magnusson, U.2    Rotondaro, A.L.P.3    Claeys, C.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.