메뉴 건너뛰기




Volumn 36, Issue 11, 1997, Pages 6932-6936

Atomic scale indium distribution in a GaN/In0.43Ga0.57N/Al0.1Ga0.9N quantum well structure

Author keywords

GaN; HRTEM; Quantum wells; Segregation

Indexed keywords

CRYSTAL GROWTH; CRYSTAL LATTICES; ETCHING; INTERFACES (MATERIALS); NITRIDES; SEMICONDUCTING ALUMINUM COMPOUNDS; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 0031271221     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.6932     Document Type: Article
Times cited : (152)

References (17)
  • 10
    • 3943073778 scopus 로고    scopus 로고
    • note
    • The implementation of quantitative HRTEM for the GaN/InN/AIN system involves several aspects that are not outlined here but will be published elsewhere. Here, it is noted that a local strain can be separated from a local compositional change because strain distorts the geometrical dimensions of the cells in a lattice image while a compositional change affects the intensity distribution within each cell. A complete analyses allows for local stress and for local composition measurements. Sample tilt affects the pattern change and can be included in the analyses if it is small (<1 mrad).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.