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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 11, 1997, Pages 6894-6899

Formation of carbon nitride films by helicon wave plasma enhanced DC sputtering

(4) Zhang, Jin Quin b Setsuhara, Yuichi b Miyake, Shoji b Kyoh, Bunkei a

a KINKI UNIVERSITY (Japan)

b OSAKA UNIVERSITY (Japan)

Author keywords

Carbon nitride film; DC sputtering; Helicon wave plasma; sp3 bonding; X ray photoelectron spectroscopy

Indexed keywords

ARGON; CHEMICAL BONDS; COMPOSITION EFFECTS; CRYSTAL MICROSTRUCTURE; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITRIDES; NITROGEN; PLASMA APPLICATIONS; SILICON; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE FILMS; HELICON WAVE-EXCITED PLASMAS;

INORGANIC COATINGS;

EID: 0031270998 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.36.6894 Document Type: Article

Times cited : (24)

References (20)

1
- 20444373328
- A. Y. Liu and M. L. Cohen: Science 245 (1989) 841.
- (1989) Science , vol.245 , pp. 841
- Liu, A.Y.¹ Cohen, M.L.²

2
- 0025521019
- C. J. Torng, J. M. Sivertsen, T. H. Judy and C. Chang: J. Mater. Res. 5 (1990) 2490.
- (1990) J. Mater. Res. , vol.5 , pp. 2490
- Torng, C.J.¹ Sivertsen, J.M.² Judy, T.H.³ Chang, C.⁴

3
- 0023983419
- H. X. Han and B. J. Feldman: Solid State Commun. 65 (1988) 921.
- (1988) Solid State Commun. , vol.65 , pp. 921
- Han, H.X.¹ Feldman, B.J.²

4
- 84957284270
- M. Y. Chen, X. Lin, V. P. Dravid, Y. W. Chung, M. S. Wong and W. D. Sproul: Surf. & coat. Technol. 54/55 (1992) 360.
- (1992) Surf. & Coat. Technol. , vol.54-55 , pp. 360
- Chen, M.Y.¹ Lin, X.² Dravid, V.P.³ Chung, Y.W.⁴ Wong, M.S.⁵ Sproul, W.D.⁶

5
- 0028481878
- H. W. Song, F. Z. Cui, X. M. He, W. Z. Li and H. D. Li: J. Phys. Condensed Matter 6 (1994) 6125.
- (1994) J. Phys. Condensed Matter , vol.6 , pp. 6125
- Song, H.W.¹ Cui, F.Z.² He, X.M.³ Li, W.Z.⁴ Li, H.D.⁵

6
- 0027626327
- C. Niu, Y. Z. Lu and C. M. Lieber: Science 261 (1993) 334.
- (1993) Science , vol.261 , pp. 334
- Niu, C.¹ Lu, Y.Z.² Lieber, C.M.³

7
- 84975361235
- O. Matsumoto, T. Kotaki, H. Shikano, K. Takemura and S. Tanaka: J. Electrochem. Soc. 141 (1994) 16.
- (1994) J. Electrochem. Soc. , vol.141 , pp. 16
- Matsumoto, O.¹ Kotaki, T.² Shikano, H.³ Takemura, K.⁴ Tanaka, S.⁵

8
- 36149032242
- F. F. Chen: Plasma Phys. & Control. Fusion 33 (1991) 339.
- (1991) Plasma Phys. & Control. Fusion , vol.33 , pp. 339
- Chen, F.F.¹

9
- 22244466913
- A. Komori, T. Shoji, K. Miyamoto, J. Kawai and Y. Kawai: Phys. Fluids B 3 (1993) 893.
- (1993) Phys. Fluids B , vol.3 , pp. 893
- Komori, A.¹ Shoji, T.² Miyamoto, K.³ Kawai, J.⁴ Kawai, Y.⁵

10
- 34648837822
- R. W. Boswell: Plasma Phys. and Controlled Fusion 26 (1984) 1147.
- (1984) Plasma Phys. and Controlled Fusion , vol.26 , pp. 1147
- Boswell, R.W.¹

11
- 0001911317
- T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota and T. Sato: Plasma Sources Sci. Technol. 2 (1993) 5.
- (1993) Plasma Sources Sci. Technol. , vol.2 , pp. 5
- Shoji, T.¹ Sakawa, Y.² Nakazawa, S.³ Kadota, K.⁴ Sato, T.⁵

12
- 0028463175
- T. Tsukada, H. Nogami, Y. Nakagawa and E. Wani: Jpn. J. Appl. Phys. 33 (1994) 4433.
- (1994) Jpn. J. Appl. Phys. , vol.33 , pp. 4433
- Tsukada, T.¹ Nogami, H.² Nakagawa, Y.³ Wani, E.⁴

13
- 0000634360
- A. J. Perry, D. Vender and R. W. Boswell: J. Vac. Sci. Technol. B 9 (1990) 310.
- (1990) J. Vac. Sci. Technol. B , vol.9 , pp. 310
- Perry, A.J.¹ Vender, D.² Boswell, R.W.³

14
- 0030516058
- J. Q. Zhang, Y. Setsuhara, T. Ariyasu and S. Miyake: J. Vac. Sci. Technol. A 14 (1996) 2163.
- (1996) J. Vac. Sci. Technol. A , vol.14 , pp. 2163
- Zhang, J.Q.¹ Setsuhara, Y.² Ariyasu, T.³ Miyake, S.⁴

15
- 0038403748
- Tokyo, Japan
- Y. Sugiyama, Y. Setsuhara, S. Miyake, Y. Sakawa and T. Shoji: Proc. 13th Symp. Plasma Processing (1996, Tokyo, Japan) p. 363.
- (1996) Proc. 13th Symp. Plasma Processing , pp. 363
- Sugiyama, Y.¹ Setsuhara, Y.² Miyake, S.³ Sakawa, Y.⁴ Shoji, T.⁵

16
- 0028445814
- H. Sjostrom, I. Ivanov, M. Johansson, L. Hultman, J. E. Sundgren, S. V. Hainsworth, T. F. Page and L. R. Wallenberg: Thin Solid Films 246 (1994) 103.
- (1994) Thin Solid Films , vol.246 , pp. 103
- Sjostrom, H.¹ Ivanov, I.² Johansson, M.³ Hultman, L.⁴ Sundgren, J.E.⁵ Hainsworth, S.V.⁶ Page, T.F.⁷ Wallenberg, L.R.⁸

17
- 0029250683
- X. Wang, P. J. Martin and T. J. Kinder: Thin Solid Films 256 (1995) 148.
- (1995) Thin Solid Films , vol.256 , pp. 148
- Wang, X.¹ Martin, P.J.² Kinder, T.J.³

18
- 0029250720
- S. Kumar and T. L. Tansley: Thin Solid Films 256 (1995) 44.
- (1995) Thin Solid Films , vol.256 , pp. 44
- Kumar, S.¹ Tansley, T.L.²

19
- 12044253618
- D. Marton, K. J. Boyd, A. H. Al-Bayati, S. S. Todorov and J. W. Rabalais: Phys. Rev. Lett. 73 (1994) 118.
- (1994) Phys. Rev. Lett. , vol.73 , pp. 118
- Marton, D.¹ Boyd, K.J.² Al-Bayati, A.H.³ Todorov, S.S.⁴ Rabalais, J.W.⁵

20
- 84907009269
- K. J. Boyd, D. Marton, S. S. Todorov, A. H. Al-Bayati, J. Kulik, R. A. Zuhr and J. W. Rabalais: J. Vac. Sci. Technol. A 13 (1995) 2110.
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 2110
- Boyd, K.J.¹ Marton, D.² Todorov, S.S.³ Al-Bayati, A.H.⁴ Kulik, J.⁵ Zuhr, R.A.⁶ Rabalais, J.W.⁷

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