Preparation of zinc oxide films by oxygen plasma treatment of zinc foils

Materials Chemistry and Physics

Volumn 51, Issue 2, 1997, Pages 142-146

  Draou, K ^a   Bellakhal, N ^a   Cheron B G ^a   Brisset, J L ^a  

^a UNIVERSITÉ DE ROUEN   (France)

Author keywords

Cathodic reduction; FTTR; Oxygen plasma; Surface treatment; Thin oxide films; UV Vis NIR; ZnO

Indexed keywords

ELECTROCHEMISTRY; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; METAL FOIL; PLASMA APPLICATIONS; REACTION KINETICS; REDOX REACTIONS; SURFACE TREATMENT; THIN FILMS; ULTRAVIOLET SPECTROSCOPY;

CATHODIC REDUCTION; INDUCTIVELY COUPLED PLASMAS (ICP);

ZINC OXIDE;

EID: 0031270514     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(97)80283-0     Document Type: Article

References (18)

1. T. Minami, H. Nanto and S. Takata, Appl. Phys. Lett., 41 (1982) 958.
2. T. Minami, H. Nanto and S. Takata, Jpn. J. Appl. Phys., 23 (1984) 280.
3. H. Nanto, T. Minami, S. Shooji and S. Takata, J. Appl. Phys., 55 (1984) 1029.
4. J.B. Webb, Thin Solid Films, 136 (1986) 135.
5. K. Miyamoto, M. Yoshida, H. Toyotama, S. Onari, and T. Arai, Jpn. J. Appl. Phys., 30 (1991) 1830.
6. A. Kuroyanagi, Jpn. J. Appl. Phys., 28 (1989) 219.
7. R.D. Armstrong and M.F. Bell, J. Electroanal. Chem., 55 (1974) 201.
8. X. Shim, D. Ren, P. Scholl and G.A. Prentice, J. Electroanal. Chem., 136 (1989) 3594.
9. E. Beucher, Thesis, Université de Rouen (1992).
10. E. Beucher, M. Lenglet and J. Lopitaux, Analusis, 18 (1990) 547.
11. E. Beucher, M. Lenglet, S. Weber and S. Scherrer, Surf. Interface Anal., 18 (1992) 673.
12. E. Beucher, B. Lefez and M. Lenglet, Phys. Status Solidi, 136 (1993) 139.
13. N. Bellakhal, K. Draou, B.C. Chéron and J.L. Brisset, in J.V. Heberlein, D.W. Ernie and J.T. Roberts (eds.), Proc. 12th Int. Symp. Plasma Chemistry, Minneapolis, USA, 1995, University of Minnesota, Minneapolis, MN, pp. 1583-1586.
14. N. Bellakhal, K. Draou, B.C. Chéron and J.L. Brisset, Mater. Sci. Eng. B, 41 (1996) 206.
15. N. Bellakhal, K. Draou and J.L. Brisset, J. Appl. Electrochem., 28 (1997) 134.
16. M. Capitelli and E. Molinari, in Kinetics of Dissociation Processes in Plasma in the Low Pressure Range, Topics in Current Chemistry, Vol. 90, Springer, Berlin, 1980.
17. S. Wickramanayaka, S. Meikle, A. Sekiguchi, M. Hosokawa and Y. Hatanaka, J. Appl. Phys., 69 (1991) 6340.
18. R.J. Brodd and J. Werth, in A.J. Bard, R. Parsons and J. Jordan (eds.), Standard Potentials in Aqueous Solutions, Marcel Dekker, New York, 1989, p. 249.