Structures and vapor-sorption characteristics of sputtered polychlorotrifluoroethylene films treated by hydrogen-plasma

Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 303-309

  Sugimoto, Iwao ^a   Nakamura, Masayuki ^a   Kuwano, Hiroki ^a   Shimada, Reiko ^b  

^a NTT CORPORATION   (Japan)

^b NTT Advanced Technology Corporation   (Japan)

Author keywords

Plasma processing and deposition; Polymers; Sensors; Sputtering

Indexed keywords

DENSIFICATION; MOLECULAR SIEVES; SOLUBILITY; SORPTION; SPUTTER DEPOSITION;

POLYCHLOROTRIFLUOROETHYLENE FILMS;

PLASTIC FILMS;

EID: 0031269591     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)80005-9     Document Type: Article

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