Field emission enhancement from Mo tip emitters coated with N containing amorphous diamond films

Surface and Coatings Technology

Volumn 94-95, Issue , 1997, Pages 672-675

  Ding, M Q ^a,b   Choi, W B ^a   Myers, A F ^a   Sharma, A K ^a   Narayan, J ^a   Cuomo, J J ^a   Hren, J J ^a  

^a North Carolina State University   (United States)

^b BEIJING VACUUM ELECTRONICS RESEARCH INSTITUTE   (China)

Author keywords

Amorphous diamond films; Mo tip emitters; Pulsed laser deposition

Indexed keywords

DEPOSITION; DIAMOND FILMS; FILM PREPARATION; INTERFACES (MATERIALS); MICROSTRUCTURE; MOLYBDENUM; NITROGEN; PULSED LASER APPLICATIONS; TRANSMISSION ELECTRON MICROSCOPY;

FIELD EMISSION ENHANCEMENT; PULSED LASER DEPOSITION;

AMORPHOUS FILMS;

EID: 0031251106     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00513-6     Document Type: Article

References (16)

1. D.R. McKenzie, D. Muller, B.A. Pailthorpe, Z.H. Wang, E. Kravtchinskaia, D. Segal, P.B. Lukins, P.D. Swift, P.J. Martin, G. Amaratunga, P.H. Gaskell and A. Saeed, Diam. Relat. Mater., 1 (1991) 51.
2. C.B. Collins, F. Davanloo, E.M. Juengerman, W.R. Osborn and D.R. Jander, Appl. Phys. Lett., 54 (1988) 216.
3. T.A. Friedmann, M.P. Siegal, D.R. Tallant, R.I. Simpson and F. Dominguez, in C.L. Renschler, D. Cox, J. Pouch and Y. Achiba (eds.), Novel Forms of Carbon II, Vol. 349, 1994.
4. Y. Lifshitz, S.R. Kasi and J.W. Rabalais, Phys. Rev. Lett., 62 (1989) 1290.
5. E.J.G. Spencer, P.H. Schmidt, D.C. Joy and F.J. Sansalone, Appl. Phys. Lett., 29 (1976) 118.
6. J.J. Cuomo, D.L. Pappas, J. Bruley, J.P. Doyle, and K.L. Saenger, J. Appl. Phys., 70 (1991) 1706.
7. R.L. David, L. Pappas, R.A. Roy, J.J. Cuomo and V.M. Sura, Appl. Phys. Lett., 61 (1992) 171.
8. T.A. Friedmann, K.F. McCarty, J.C. Barbour, M.P. Siegal and D.C. Dibble, Appl. Phys. Lett., 68 (1996) 1643.
9. C. Xie, N. Kumar and C.B. Collins, 6th IVMC 93, 1993, p. 162.
10. Z. Feng, I.G. Brown and J.W. Ager, J. Mater. Res., 10 (1995) 1585.
11. G.A.J. Amaratunga and S.R.P. Silva, Appl. Phys. Lett., 68 (1996).
12. F.Y. Chung, C.Y. Sun, H.F. Chang, C.M. Hung and I.N. Lin, Appl. Phys. Lett., 68 (1996) 1666.
13. M.Q. Ding, A.F. Myers, W.B. Choi, R.D. Vispute, S.M. Champhausen, J. Narayan, J.J. Cuomo and J.J. Hren, J. Vac. Sci. Technol. B, (1997) in press.
14. M.W. Geis, J.C. Twichell and T.M. Lyszczarz, J. Vac. Sci. Technol. B, 14 (3) (1996) 2060.
15. J. Robertson, and C.A. Davis, Diam. Relat. Mater., 4 (1995) 441.
16. V.S. Veerasamy, J. Yuan, G.A.J. Amaratunga, W.I. Miline, K.W.R. Gilkes, M. Weiler and L.M. Brown, Phys. Rev. B, 48 (24) (1993) 17954.