Structural characterization of self-assembled quantum dot structures by X-ray diffraction techniques

Thin Solid Films

Volumn 306, Issue 2, 1997, Pages 198-204

  Darhuber, A A ^a   Stangl, J ^a   Holy, V ^a,e   Bauer, G ^a   Krost, A ^b   Grundmann, M ^b   Bimberg, D ^b   Ustinov, V M ^c   Kop'ev, P S ^c   Kosogov, A O ^d   Werner, P ^d  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^b TECHNISCHE UNIVERSITÄT BERLIN   (Germany)

^c IOFFE INSTITUTE   (Russian Federation)

^d MAX PLANCK INSTITUTE OF MICROSTRUCTURE PHYSICS   (Germany)

^e MASARYK UNIVERSITY   (Czech Republic)

Author keywords

Reciprocal space mapping; Self assembled quantum dots; X ray diffraction

Indexed keywords

ANISOTROPY; ELECTROMAGNETIC WAVE REFLECTION; ELECTROMAGNETIC WAVE SCATTERING; LATTICE CONSTANTS; MOLECULAR BEAM EPITAXY; MULTILAYERS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR GROWTH; X RAY DIFFRACTION ANALYSIS;

RECIPROCAL SPACE MAPPING; X RAY REFLECTION;

SEMICONDUCTOR QUANTUM DOTS;

EID: 0031224701     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00097-7     Document Type: Article

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