Van der Waals epitaxy with C60 molecules and change of the growth mechanism by Ba-doping

Thin Solid Films

Volumn 306, Issue 2, 1997, Pages 313-319

  Sitter, H ^a   Stifter, D ^a   Manh, T Nguyen ^a  

^a JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

Author keywords

Ba as dopant in C60; Doping of fullerenes in high vacuum growth; Fullerenes Van der Waals epitaxy

Indexed keywords

BARIUM; BARIUM COMPOUNDS; CHARGE TRANSFER; DOPING (ADDITIVES); FILM GROWTH; FULLERENES; VAN DER WAALS FORCES;

FULLERENES VAN DER WAALS EPITAXY; HOT WALL EPITAXY (HWE); STICKING COEFFICIENT;

EPITAXIAL GROWTH;

EID: 0031224341     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00241-1     Document Type: Article

References (20)

1. W. Krakow, N.M. Rivera, R.A. Roy, R.S. Ruoff, J.J. Cuomo, Appl. Phys. A56 (1993) 185.
2. D. Schmicker, S. Schmidt, J.G. Skofronick, J.P. Toennies, R. Vollmer, Phys. Rev. B44 (1991) 10995.
3. K. Tanigaki, S. Kuroshima, J. Fujita, T.W. Ebbesen, Appl. Phys. Lett. 63 (1993) 2351.
4. H.-G. Busmann, R. Hiss, H. Gaber, I.V. Hertel, Surf. Sci. 289 (1993) 381.
5. J.E. Fischer, E. Werwa, P.A. Heiney, Appl. Phys. A56 (1993) 193.
6. S. Henke, K.H. Thürer, J.K.N. Lindner, B. Rauschenbach, B. Stritzker, J. Appl. Phys. 76 (1994) 3337.
7. M. Sakurai, H. Tada, K. Saiki, A. Koma, Jpn. J. Appl. Phys. 30 (1991) LL1892.
8. D. Stifter, H. Sitter, Appl. Phys. Lett. 66 (1995) 679.
9. D. Stifter, H. Sitter, Physics and Chemistry of Fullerenes and Derivatives, in: H. Kuzmany, J. Fink, M. Mehring, S. Roth (Eds.), World Scientific, 1995, pp. 31-34.
10. J.A. Dura, P.M. Pippenger, N.J. Halas, X.Z. Xiong, P.C. Chow, S.C. Moss, Appl. Phys. Lett. 63 (1993) 3443.
11. A. Fartash, Appl. Phys. Lett. 64 (1994) 1877.
12. M.S. Dresselhaus, G. Dresselhaus, P.C. Eklund, Science of Fullerenes and Carbon Nanotubes, Academic Press, San Diego, 1996.
13. Y. Chen, F. Stepniak, J.H. Weaver, L.P.F. Chibante, R.E. Smalley, Phys. Rev. B 45 (1992) 8845.
14. A. Lopez-Otero, Thin Solid Films 49 (1978) 3.
15. V. Holy, J. Kubena, E. Abramof, K. Lischka, A. Pesek, E. Koppensteiner, J. Appl. Phys. 74 (1993) 1736.
16. J. Abrefah, D.R. Olander, M. Balooch, W.J. Siekhaus, Appl. Phys. Lett. 60 (1992) 1313.
17. D. Stifter, H. Sitter, Thin Solid Films 280 (1996) 83.
18. M. Haluska, H. Kuzmany, M. Vybornov, P. Rogl, P. Fejdi, Appl. Phys. A56 (1993) 161.
19. A. Oshiyama, S. Saito, N. Hamada, Y. Miyamoto, J. Phys. Chem Solids 53 (1992) 1457.
20. R.C. Haddon, G.P. Kochanski, A.F. Hebard, A.T. Fiory, R.C. Morris, A.S. Percel, Chem. Phys. Lett. 203 (1993) 433.