Oriented growth of diamond on thermally carburized silicon substrates

Diamond and Related Materials

Volumn 5, Issue 1, 1996, Pages 43-47

  Yokonaga, Noriyuki ^a   Katsu, Yoshihiro ^a   Machida, Takahiro ^a   Inuzuka, Tadao ^a   Koizumi, Satoshi ^b   Suzuki, Kazuhiro ^c  

^a AOYAMA GAKUIN UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^c TO PLAS Co   (Japan)

Author keywords

CVD; Diamond thin firm; Epitaxy; Silicon; Thermal carburization

Indexed keywords

EID: 0001038423     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00334-7     Document Type: Article

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