Sensitive stress-impedance micro sensor using amorphous magnetostrictive wire

IEEE Transactions on Magnetics

Volumn 33, Issue 5 PART 1, 1997, Pages 3355-3357

  Shen, L P ^a   Uchiyama, T ^b   Mohri, K ^b   Kita, E ^a   Bushida, K ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b UNITIKA LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; CMOS INTEGRATED CIRCUITS; COBALT ALLOYS; MAGNETOSTRICTION; MULTIVIBRATORS; SENSORS; STRAIN GAGES; WIRE;

AMORPHOUS WIRES; SENSITIVE STRESS IMPEDANCE MICROSENSORS;

MAGNETIC MATERIALS;

EID: 0031221540     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.617942     Document Type: Article

References (6)

1. Y.S.Lee and K.D.Wise, "A batch-fabricated silicon capacitive pressure transducer with low temperature sensitivity", IEEE Trans, on Electron Devices, ED-29, No.l, p.42, 1982.
2. K.Mohri, "Application of amorphous magnetic wires to computer peripherals", Materials Science and Engineering, vol.A 185, pp.141-145, 1994.
3. L.V.Panina and K.Mohri, "Magneto-impedance effect in amorphous wires", Appl. Phys. Lett., vol.65, pp.1189-1191, 1994.
4. T. Uchiyama, K.Mohri, L.V.Panina and K.Furuno, "Magnetoimpedance in sputtered amorphous film for micro magnetic sensor", IEEE Trans. Magn., vol.32, No.6, pp.3182-3184, 1995.
5. K.Bushida, K.Mohri, T.Kanno, D.Katoh and A. Kobayshi, "Amorphous wire Ml micro magnetic sensor for gradient field detection", IEEE Trans. Magn., vol.32, No.5, pp.4944-4946, 1996.
6. T.Kanno, K.Mohri and K.Bushida , "C-MOS multivibrator type micro magnetic sensor using amorphous wire magnetoimpedance (MI) head", Trans. IEE of Japan,vol.ll6-E, No. 10, pp.435-440, 1996.