A Batch-Fabricated Silicon Capacitive Pressure Transducer With Low Temperature Sensitivity

IEEE Transactions on Electron Devices

Volumn 29, Issue 1, 1982, Pages 42-48

  Lee, Yong S ^a   Wise, Kensall D ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PRESSURE TRANSDUCERS;

EID: 0019899398     PISSN: 00189383     EISSN: 15579646     Source Type: Journal    
DOI: 10.1109/T-ED.1982.20656     Document Type: Article

References (17)

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2. S. K. Clark and K. D. Wise, “Pressure sensitivity in anisotropically etched thin-diaphragm pressure sensors,” ZEEE Trans. Electron Devices, vol. ED-26, pp. 1887-1896, Dec. 1979.
3. Samaun, K. D. Wise, and J. B. Angell, “An IC piezoresistive pressure sensor for biomedical instrumentation,” ZEEE Trans. Biomed. Eng., vol. BME-20, pp. 101-109, Mar. 1973.
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8. O.N. Tufte, P. W. Chapman, and D. Long, “Silicon diffusedelement piezoresistive diaphragms,” J. Appl. Phys., vol. 33, pp.
9. G. Wallis and D. I. Pomerantz, “Field-assisted glass-metal sealing,” J. Appl. Phys.,vol. 10,pp. 3946-3949, Sept. 1969.
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13. J. B. Price, “Anisotropic etching of silicon with KOH-H20- isopropyl alcohol,” in Semiconductor Silicon. New York: Electrochem. SOC., 1973.
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