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Volumn 306, Issue 2, 1997, Pages 266-270
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Ultrahigh vacuum atomic layer epitaxy of Cd1-xMnxTe layers grown on ZnTe/GaAs(100) substrates: Reflection mass spectrometry studies
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Author keywords
Atomic layer epitaxy; Reflection mass spectrometry; Thin film growth in ultrahigh vacuum
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Indexed keywords
FILM GROWTH;
MASS SPECTROMETRY;
MOLECULAR BEAM EPITAXY;
REFLECTION HIGH ENERGY ELECTRON DIFFRACTION;
SEMICONDUCTING CADMIUM COMPOUNDS;
SEMICONDUCTING GALLIUM ARSENIDE;
SEMICONDUCTING ZINC COMPOUNDS;
SUBSTRATES;
SURFACE STRUCTURE;
THIN FILMS;
REFLECTION MASS SPECTROMETRY (REMS);
SURFACE RECONSTRUCTION;
ULTRAHIGH VACUUM ATOMIC LAYER EPITAXY;
SEMICONDUCTING FILMS;
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EID: 0031220818
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(97)00236-8 Document Type: Article |
Times cited : (8)
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References (10)
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