UHV reflection electron microscopy investigation of the monoatomic steps on the silicon (111) surface at homo- and heteroepitaxial growth

Thin Solid Films

Volumn 306, Issue 2, 1997, Pages 205-213

  Latyshev, A V ^a   Krasilnikov, A B ^a   Aseev, A L ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

Author keywords

Epitaxy; Reflection electron microscopy; Silicon; Surface phenomena

Indexed keywords

CHEMICAL CLEANING; ELECTRON MICROSCOPY; FILM GROWTH; MORPHOLOGY; NUCLEATION; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SUBSTRATES; SURFACE PHENOMENA; SURFACE STRUCTURE;

ULTRAHIGH VACUUM REFLECTION ELECTRON MICROSCOPY (UHV REM);

EPITAXIAL GROWTH;

EID: 0031220429     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00096-5     Document Type: Article

References (39)

1. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, Microsc. Res. Technique 20 (1992) 341.
2. A.V. Latyshev, A.L. Aseev, A.B. Krasilnikov, S.I. Stenin, Phys. Status Solidi (a) 113 (1989) 421.
3. Y.N. Yang, E.D. Williams, J. Vac. Sci. Technol. A8 (1990) 2481.
4. A.V. Latyshev, A.L. Aseev, A.B. Krasilnikov, S.I. Stenin, Surf. Sci. 227 (1990) 24.
5. N. Osakabe, Y. Tanishiro, K. Yagi, G. Honjo, Surf. Sci. 97 (1980) 493.
6. H. Shuman, Ultramicroscopy 2 (1977) 361.
7. N. Osakabe, Y. Tanishiro, K. Yagi, G. Honjo, Surf. Sci. 102 (1981) 424.
8. W.K. Burton, N. Cabrera, F.C. Frank, Philos. Trans. Roy. Soc. London, Ser. A243 (1951) 299.
9. C. Alfonso, J.M. Bermond, J.C. Heyraud, J.J. Metois, Surf. Sci. 262 (1992) 371.
10. A.V. Latyshev, A.L. Aseev, A.B. Krasilnikov, S.I. Stenin, Surf. Sci. 213 (1989) 157.
11. S. Stoyanov, Europhys. Lett., 11 (1990) 361; Jpn. J. Appl. Phys., 29 (1990) L659; 30 (1991) 1.
12. S. Stoyanov, Europhys. Lett., 11 (1990) 361; Jpn. J. Appl. Phys., 29 (1990) L659; 30 (1991) 1.
13. S. Stoyanov, Europhys. Lett., 11 (1990) 361; Jpn. J. Appl. Phys., 29 (1990) L659; 30 (1991) 1.
14. C. Alfonso, J.C. Heyraud, J.J. Metois, Surf. Sci. Lett. 291 (1993) L745.
15. K. Yagi, Surf. Sci. Rep. 17 (1993) 305.
16. Y. Homma, R.J. McClelland, H. Hibino, Jpn. J. Appl. Phys. 29 (1990) L2254.
17. M. Ichikawa, T. Doi, Appl. Phys. Lett. 60 (1992) 1082.
18. A. Natori, H. Fujimura, M. Fukuda, Appl. Surf. Sci. 60/61 (1992) 85.
19. M. Uwaha, Phys. Rev. B46 (1992) 4364.
20. J. Krug, H. Dobbs, Phys. Rev. Lett. 73 (1994) 1947.
21. B. Houchmandzadeh, C. Misbah, A. Pimpinelli, J. Phys. France 4 (1994) 1843.
22. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, S.I. Stenin, JETP Lett. 48 (1988) 526.
23. H. Kahata, K. Yagi, Jpn. J. Appl. Phys. 28 (1989) L858.
24. Y. Enta, S. Suzuki, S. Kono, Phys. Rev. B39 (1989) 5524.
25. A.V. Litvin, A.B. Krasilnikov, A.V. Latyshev, Surf. Sci. Lett. 244 (1991) L121.
26. T. Suzuki, J.J. Metois, K. Yagi, Surf. Sci. 339 (1995) 105.
27. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, Ultramicroscopy 48 (1993) 377.
28. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, Surf. Sci. 277 (1994) 24.
29. A.B. Krasilnikov, A.V. Latyshev, A.L. Aseev, S.I. Stenin, J. Cryst. Growth 116 (1992) 178.
30. N. Osakabe, Y. Tanishiro, K. Yagi, G. Honjo, Surf. Sci. 109 (1981) 353.
31. Y. Homma, M. Suzuki, H. Hibino, Appl. Surf. Sci. 60/61 (1992) 479.
32. K. Yagi, Y. Tanishiro, Phase Trans. 53 (1995) 197.
33. T.M. Jung, R.J. Phaneuf, E.D. Williams, Surf. Sci. 301 (1994) .
34. A.B. Krasilnikov, A.V. Latyshev, A.L. Aseev, Surf. Sci. 290 (1993) 232-238.
35. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, Phys. Rev. B54 (1996) 2586.
36. S. Stoyanov, J. Cryst. Growth 94 (1989) 751.
37. J.A. Venables, Surf. Sci. 299/300 (1994) 798.
38. A.V. Latyshev, A.B. Krasilnikov, A.L. Aseev, Thin Solid Films 281-282 (1996) 20-23.
39. H. Yamaguchi, Y. Tanishiro, K. Yagi, Appl. Surf. Sci. 60/61 (1992) 79.