Application of MO calculation to plasma-enhanced CVD using organosilicon compounds

Bulletin of Materials Science

Volumn 20, Issue 6, 1997, Pages 817-822

  Tarai, Osamu ^a   Hozumi, Atsushi ^a   Inoue, Yasushi ^a   Komori, Takashi ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

MO calculation; Plasma enhanced CVD; Water repellency

Indexed keywords

CALCULATIONS; PHYSICAL CHEMISTRY; PLASMA APPLICATIONS; SILANES;

MOLECULAR ORBITAL METHOD; ORGANOSILICON COMPOUNDS;

CHEMICAL VAPOR DEPOSITION;

EID: 0031219778     PISSN: 02504707     EISSN: None     Source Type: Journal    
DOI: 10.1007/bf02747421     Document Type: Article

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