Surface characterization of sidewall protection film on GaAs steep via holes etched by magnetron ion etching

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 1, 1996, Pages 112-117

  Takano, H ^a,b   Sumitani, K ^a,c   Matsuoka, H ^a,c   Sato, K ^a,b   Ishihara, O ^a,b   Tsubouchi, N ^a,b  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

^b Optoelectron Microwave Devices Lab

^c Kita Itami Works ^*

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343695320     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.589036     Document Type: Article

References (11)

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