Influence of the applied field frequency on the characteristics of Ar and SF6 diffusion plasmas sustained at electron cyclotron resonance above multipolar magnetic field structures

Plasma Sources Science and Technology

Volumn 6, Issue 3, 1997, Pages 386-393

  Lagarde, T ^a,b   Arnal, Y ^a   Pelletier, J ^a  

^a CNRS   (France)

^b Metal Process   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC DISCHARGES; ELECTRON CYCLOTRON RESONANCE; MAGNETIC FIELD EFFECTS; MICROWAVES; PLASMA CONFINEMENT; PLASMA DENSITY; SATURATION (MATERIALS COMPOSITION); SULFUR COMPOUNDS; WAVE PLASMA INTERACTIONS;

ACTINOMETRY; DIFFUSION PLASMAS; MULTIPOLAR MAGNETIC FIELDS;

PLASMAS;

EID: 0031211680     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/6/3/015     Document Type: Article

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