Plasma diagnosis with Langmuir probe in the process of vacuum arc deposition

International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

Volumn 2, Issue , 1996, Pages 858-862

  Cheng, Zhong Yuang ^a   Zou, Ji Yan ^a   Yang, Lei ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CALCULATIONS; CARRIER CONCENTRATION; DEPOSITION; ELECTRIC ARCS; MATHEMATICAL MODELS; PLASMA COLLISION PROCESSES; PLASMA PROBES; TITANIUM NITRIDE; VACUUM;

ELECTRON TEMPERATURE; LANGMUIR PROBES; LANGMUIR THICK SHEATH MODEL; NON ELASTIC COLLISIONS; PARTIAL PRESSURE; VACUUM ARC DEPOSITION;

PLASMA DIAGNOSTICS;

EID: 0029714760     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (16)