Monitoring wafer map data from integrated circuit fabrication processes for spatially clustered defects

Technometrics

Volumn 39, Issue 3, 1997, Pages 241-253

  Hansen, Mark H ^a   Nair, Vijayan N ^b   Friedman, David J ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c Integral Inc   (United States)

Author keywords

Join count statistic; Markov random field; Quality improvement; Spatial randomness; Statistical process control

Indexed keywords

DEFECTS; INTEGRATED CIRCUIT MANUFACTURE; MARKOV PROCESSES; MONITORING; QUALITY CONTROL;

JOINT COUNT STATISTIC; MARKOV RANDOM FIELD; SPATIAL CLUSTERING; SPATIAL RANDOMNESS;

STATISTICAL PROCESS CONTROL;

EID: 0031200533     PISSN: 00401706     EISSN: 15372723     Source Type: Journal    
DOI: 10.1080/00401706.1997.10485116     Document Type: Article

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