Nanostructuring of laser-deposited Ti films by self-limited oxidation

Journal of the American Ceramic Society

Volumn 80, Issue 7, 1997, Pages 1663-1667

  Gorbunov, Andre A ^a   Pompe, Wolfgang ^a,c   Eichler, Horst ^a   Huey, Bryan ^b   Bonnell, Dawn A ^b,c  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

^c AMERICAN CERAMIC SOCIETY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL REACTIONS; CRYSTAL STRUCTURE; DEPOSITION; GLASS; LASER APPLICATIONS; LIGHT ABSORPTION; OXIDATION; SCANNING; TITANIUM;

ABSORPTIVITY; ARGON ION LASER; ENERGY DISPERSIVE X RAY SPECTROSCOPY; INITIAL FILM THICKNESS; LASER INDUCED OXIDATION; NANOSTRUCTURING TECHNIQUE; OPTICAL CONTRAST; THIN TITANIUM FILM; TRANSPARENT OXIDE LINE STRUCTURE; WRITING PROCESS;

THIN FILMS;

EID: 0031190427     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.1997.tb03035.x     Document Type: Article

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