Lateral self-limitation in the laser-induced oxidation of ultrathin metal films

Applied Physics Letters

Volumn 69, Issue 19, 1996, Pages 2816-2818

  Gorbunov, A A ^a   Eichler, H ^a   Pompe, W ^a   Huey, B ^b  

^a Ger   (Germany)

^b UNIVERSITY OF PENNSYLVANIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATOMIC FORCE MICROSCOPY; CONTINUOUS WAVE LASERS; DIFFRACTION GRATINGS; LASER BEAM EFFECTS; LIGHT ABSORPTION; OPTICAL RESOLVING POWER; OXIDATION; RADIATION; THICKNESS MEASUREMENT; TITANIUM; ULTRATHIN FILMS;

ABSOLUTE DIFFRACTION LIMIT; ARGON ION LASER; LASER INDUCED THERMOCHEMICAL OXIDATION; LASER SCANNING MICROSCOPE; OXIDE LINES; ULTRATHIN METAL FILMS;

METALLIC FILMS;

EID: 0030569184     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116853     Document Type: Article

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