Masking problem in the fabrication of optical waveguide structures in glass by double ion exchange

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 A, 1997, Pages 4320-4322

  Pantchev, Blagoy ^a   Danesh, Parvaheh ^a  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

Glass; Ion exchange; Metal and dielectric films; Optical waveguides; Polyimide films; Thin film lenses

Indexed keywords

DOUBLE ION EXCHANGES; HIGH TEMPERATURE SILICON VARNISH FILMS; PIERCING DEFECTS;

CRYSTAL DEFECTS; DIELECTRIC FILMS; FILM PREPARATION; ION EXCHANGE; MASKS; METALLIC FILMS; POLYIMIDES; SEMICONDUCTING GLASS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE STRUCTURES; THICKNESS MEASUREMENT;

OPTICAL WAVEGUIDES;

EID: 0031187179     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4320     Document Type: Article

References (12)

1. L. Ross: Glastech. Ber. 62 (1989) 285.
2. R. Srivastava and R. V. Ramaswamy: Proc. SPIE 1583 (1991) 2.
3. G. H. Chartier, P. J. R. Laybourn and A. Girod: Electron. Lett. 22 (1986) 925.
4. A. Tervonen and Z. Honkanen: Opt. Lett. 13 (1988) 71.
5. G. C. Righini, R. Shen and G. Belli: Proc. SPIE 1128 (1989) 103.
6. B. G. Pantchev and P. Danesh: Thin Solid Films 161 (988) 85.
7. P. Danesh and B. Pantchev: Amorphous Silicon and Related Materials, ed. H. Fritzsche (World Scientific, Singapore, 1988) p. 81.
8. I. Shopov, P. Kirova, K. Batev and E. Venkova: Bulg. Patent 33359 (1983).
9. K. Batev, E. Venkova, E. Spasova and G. Danev: Electroind. & Circuit Design 3 (1987) 37 [in Bulgarian].
10. D. Y. Zang and C. S. Tsai: Appl. Opt. 25 (1986) 2264.
11. B. Pantchev and Z. Nikolov: Jpn. J. Appl. Phys. 33 (1994) 1040.
12. R. Ulrich and H. Weber: Appl. Opt. 11 (1972) 428.