Field-assisted ion exchange for the detection of localized defects in thin films on glass substrates

Thin Solid Films

Volumn 161, Issue C, 1988, Pages 85-91

  Pantchev, B G ^a   Danesh, P ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ION EXCHANGE; METALS AND ALLOYS - THIN FILMS; SEMICONDUCTOR MATERIALS - THIN FILMS;

INTERFERENCE MICROSCOPE; LOCALIZED DEFECTS;

FILMS;

EID: 0024050858     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(88)90238-6     Document Type: Article

References (19)

1. Array of Distributed-Index Planar Micro-Lenses Prepared from Ion Exchange Technique
2. Electrical Breakdown in Thin Dielectric Films
3. Nondestructive optical technique for electrically testing insulated-gate integrated circuits
4. Nondestructive Location of Oxide Breakdowns on MOSFET Structures
5. Evaluation of the Pinhole Density in SiO[sub 2] Film by Plasma Etching
6. Optical Waveguides Formed by Thermal Migration of Ions in Glass
7. Field-induced index profiles of multimode ion-exchanged strip waveguides
8. Planar optical waveguides formed by silver-ion migration in glass