Compositional and electrical properties of ECR-CVD silicon oxynitrides

Semiconductor Science and Technology

Volumn 12, Issue 7, 1997, Pages 927-932

  Hernandez, M J ^a   Garrido, J ^a   Martinez, J ^a   Piqueras, J ^a  

^a UNIVERSIDAD AUTÓNOMA DE MADRID   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC PROPERTIES; ELECTRON CYCLOTRON RESONANCE; GASES; INFRARED SPECTROSCOPY; MOS DEVICES; SEMICONDUCTING SILICON COMPOUNDS; STOICHIOMETRY;

SILICON OXYNITRIDE;

SEMICONDUCTING FILMS;

EID: 0031186403     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/12/7/027     Document Type: Article

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