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Volumn 69, Issue 13, 1996, Pages 1873-1875

Rapid solid phase crystallization of nanocrystalline silicon deposited by electron cyclotron plasma chemical vapor deposition

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[No Author keywords available]

Indexed keywords


EID: 0344285146     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117462     Document Type: Article
Times cited : (6)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.