Etching of tantalum in fluorine-containing high density plasmas

Journal of the Electrochemical Society

Volumn 143, Issue 10, 1996, Pages 3266-3273

  Hsiao, R ^a   Miller, D ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; ELECTRON SPECTROSCOPY; FLUORINE; MATHEMATICAL MODELS; PLASMA ETCHING; PRESSURE; TANTALUM;

BIAS POWER; GAS COMPOSITION; HIGH DENSITY PLASMAS; INDUCTIVE POWER; RESPONSE SURFACE METHOD;

PLASMAS;

EID: 0030259319     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837195     Document Type: Article

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