Two dimensional fluid model of RF plasmas in SiH4/Ar mixtures

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4794-4798

  Sato, Nobuyasu ^a   Shida, Yutaka ^a  

^a IWATE UNIVERSITY   (Japan)

Author keywords

Argon; Fluid model; Modeling; Particle growth; Radicals; rf plasma; Silane

Indexed keywords

ARGON; BINARY MIXTURES; ELECTRIC FIELD EFFECTS; ELECTRODES; ELECTRON EMISSION; FREE RADICALS; MATHEMATICAL MODELS; SILANES; TRANSPORT PROPERTIES;

FLUID MODELS;

PLASMA THEORY;

EID: 0031177469     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4794     Document Type: Article

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