A plasma source using waves in a lower hybrid frequency range

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 7 SUPPL. B, 1997, Pages 4572-4575

  Yasaka, Yasuyoshi ^a   Ohnishi, Keitaro ^a   Kikuchi, Tetsuo ^a   Tachibana, Kunihide ^a   Itoh, Tohru ^b  

^a KYOTO UNIVERSITY   (Japan)

^b Plasma System Corporation   (Japan)

Author keywords

Landau damping; Large diameter plasma; Lower hybrid wave; Plasma production; Two dimensional simulation

Indexed keywords

COMPUTATIONAL FLUID DYNAMICS; COMPUTER SIMULATION; COMPUTER SOFTWARE; DIFFUSION; ELECTRON ABSORPTION; MAGNETIC FIELD EFFECTS; PLASMA DENSITY;

LANDAU DAMPING;

PLASMA SOURCES;

EID: 0031175873     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.4572     Document Type: Article

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