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Sensors and Actuators, A: Physical

Volumn 62, Issue 1-3, 1997, Pages 705-710

Ion implantation for nucleation of electroless Ni films on <100> Si

(4) Bhansali, Shekhar a Sood, Dinesh K a Evans, Peter J d Brown, Ian G b,c

a RMIT UNIVERSITY (Australia)

b LAWRENCE BERKELEY NATIONAL LABORATORY (United States)

c UNIVERSITY OF CALIFORNIA (United States)

d University of California ^*

Author keywords

Electroless nickel films; Ion implantation; Silicon

Indexed keywords

ADHESION; FILM GROWTH; ION IMPLANTATION; METALLIC FILMS; MORPHOLOGY; NICKEL PLATING; NUCLEATION; PALLADIUM; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; SUBSTRATES;

ELECTROLESS NICKEL FILMS; ENERGY DISPERSIVE X RAY (EDX) ANALYSIS; METAL VAPOUR VACUUM ARC (MEVVA) ION IMPLANTERS;

ELECTROLESS PLATING;

EID: 0031175834 PISSN: 09244247 EISSN: None Source Type: Journal
DOI: 10.1016/S0924-4247(97)01622-1 Document Type: Article

Times cited : (5)

References (8)

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6
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.