Adsorption and thermal decomposition of N2O on Si(100): Electron energy loss spectroscopy and thermal desorption studies

Surface Science

Volumn 382, Issue 1-3, 1997, Pages 214-220

  Kubo, T ^c   Ema, T ^a,c   Atli, A ^b,c   Aruga, T ^c   Takagi, N ^c   Nishijima, M ^c  

^a NEC CORPORATION   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

^c KYOTO UNIVERSITY   (Japan)

Author keywords

Chemisorption; Electron energy loss spectroscopy; Nitrous oxide (N2O); Silicon; Surface chemical reaction; Thermal desorption; Thermal desorption spectroscopy; Vibrations of adsorbed molecules

Indexed keywords

CHEMICAL BONDS; CHEMISORPTION; DISSOCIATION; ELECTRON ENERGY LOSS SPECTROSCOPY; GAS ADSORPTION; MOLECULAR VIBRATIONS; NITROGEN; NITROGEN OXIDES; OXYGEN; PYROLYSIS; SURFACE PHENOMENA; THERMAL EFFECTS;

SURFACE CHEMICAL REACTION; THERMAL DESORPTION SPECTROSCOPY;

SEMICONDUCTING SILICON;

EID: 0031169216     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00146-5     Document Type: Article

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