Microstructural studies of Fe-silicide films produced by metal vapor vacuum arc ion implantation of Fe into Si substrates

Applied Surface Science

Volumn 115, Issue 2, 1997, Pages 116-123

  Jin, S ^a   Bender, H ^a   Li, X N ^b,c   Zhang, Z ^b   Dong, C ^c   Gong, Z X ^c   Ma, T C ^c  

^a IMEC   (Belgium)

^b INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^c DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; ION IMPLANTATION; IRON COMPOUNDS; SEMICONDUCTING SILICON; SUBSTRATES;

METAL VAPOR VACUUM ARC IMPLANTATION;

METALLIC FILMS;

EID: 0031168626     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(97)80193-6     Document Type: Article

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