Morphology of TiSi2 films on si formed from co-deposited Ti and Si

Thin Solid Films

Volumn 302, Issue 1-2, 1997, Pages 127-132

  Herner, S B ^a,b   Krishnamoorthy, V ^a   Naman, A ^a   Jones, K S ^a   Gossmann, H J ^b   Tung, R T ^b  

^a University of Florida   (United States)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

Silicides; Transmission electron microscopy (TEM)

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; DEPOSITION; DIFFUSION IN SOLIDS; MORPHOLOGY; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON COMPOUNDS; STRESSES; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

TITANIUM DISILICIDE;

SEMICONDUCTING FILMS;

EID: 0031165625     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09586-7     Document Type: Article

References (21)

1. K. Maex, Mat. Sci. Eng. Rep. R11 (1993) 53.
2. A.E. Morgan, E.K. Broadbent, A.H. Reader, Mat. Res. Soc. Sym. Proc. 52 (1986) 279.
3. S.B. Desu, J.A. Taylor, J. Am. Ceram. Soc. 73 (1990) 509.
4. W. Lur, L.J. Chen, J. Appl. Phys. 66 (1989) 3604.
5. M.H. Wang, W. Lur, H.C. Cheng, L.J. Chen, Mat. Res. Soc. Sym. Proc. 100 (1988) 93.
6. H. Jeon, C.A. Sukow, J.W. Honeycutt, G.A. Rozgonyi, R.J. Nemanich, J. Appl. Phys. 71 (1992) 4269.
7. Q.Z. Hong, S.Q. Hong, F.M. D'Heurle, J.M.E. Harper, Thin Solid Films 253 (1994) 279.
8. R.T. Tung, Appl. Phys. Lett. 68 (1996) 1933.
9. R. Madar, C. Bernard, Appl. Surf. Sci. 53 (1991) 1.
10. S.B. Herner, K.S. Jones, H.-J. Gossmann, R.T. Tung, J.M. Poate, H.S. Luftman, Appl. Phys. Lett. 68 (1996) 3870.
11. L. Doolittle, M. Thompson, RUMP Users Manual, Cornell University, Ithaca, NY, 1985-1994.
12. Philips High Resolution Diffractometer Instruction Manual, 2nd ed., Eindhoven, Netherlands, 1989.
13. R. Messier, J. Vac. Sci. Tech. A 4 (1986) 490.
14. S.P. Murarka, Silicides for VLSI Applications, Academic Press, New York, 1983.
15. C.A. Sukow, R.J. Nemanich, J. Mat. Res. 9 (1994) 1214.
16. W.K. Chu, S.S. Lau, J.W. Mayer, H. Muller, K.N. Tu, Thin Solid Films 25 (1975) 393.
17. J.F. Jongste, F.E. Prins, G.C.A.M. Janssen, S. Radelaar, Appl. Surf. Sci. 38 (1989) 57.
18. J.W. Honeycutt, J. Ravi, G.A. Rozgonyi, Mat. Res. Soc. Sym. Proc. 262 (1992) 701.
19. V. Svilan, J.M.E. Harper, C. Cabral Jr., L.A. Clevenger, Mat. Res. Soc. Sym. Proc., to be published.
20. S.P. Murarka, D.B. Fraser, J. Appl. Phys. 51 (1980) 350.
21. Y. Shor, J. Pelleg, Mat. Res. Soc. Sym. Proc. 402 (1996) 107.