Characterization of unintentionally or lightly doped polysilicon films by improved Hall effect measurements

Thin Solid Films

Volumn 301, Issue 1-2, 1997, Pages 230-235

  Le Bihan, F ^a   Fortin, B ^a   Cauneau, S ^a,b   Briand, D ^a   Bonnaud, O ^a  

^a UNIVERSITÉ DE RENNES 1   (France)

^b COMPAS Design Automation ^*  (France)

Author keywords

Chemical vapour deposition (CVD); Electrical properties and measurements; Hall effect; Silicon

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY OF SOLIDS; HALL EFFECT; MAGNETIC FIELD MEASUREMENT; SEMICONDUCTING SILICON;

MAGNETIC FLUX DENSITY; POLYSILICON FILMS;

SEMICONDUCTING FILMS;

EID: 0031153326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09549-1     Document Type: Article

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