Scanning tunneling microscopy of N2H4 on silicon surfaces

Surface Science

Volumn 380, Issue 2-3, 1997, Pages 481-488

  Tindall, C ^a   Li, L ^a   Takaoka, O ^a   Hasegawa, Y ^a   Sakurai, T ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Low index single crystal surfaces; Scanning tunneling microscopy; Silicon; Silicon nitride; Surface chemical reaction

Indexed keywords

ADSORPTION; ANNEALING; ATOMS; CHEMICAL BONDS; CRYSTAL ORIENTATION; NITROGEN COMPOUNDS; SCANNING TUNNELING MICROSCOPY; SUBSTRATES; THERMAL EFFECTS;

LOW INDEX SINGLE CRYSTAL SURFACES; NITROGEN HYDRIDE;

SILICON;

EID: 0031145050     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(97)00027-7     Document Type: Article

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