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Surface Science

Volumn 380, Issue 1, 1997, Pages

Oxidation kinetics of epitaxial Ge-covered Si(100) surfaces

(2) Fukuda, T a Ogino, T a

a Kashino Diverse Brain Research Laboratory of NTT Communication Science Laboratories (Japan)

Author keywords

Germanium; Oxidation; Silicon

Indexed keywords

COMPRESSIVE STRENGTH; CRYSTAL LATTICES; EPITAXIAL GROWTH; GERMANIUM; REACTION KINETICS; STRAIN; SURFACE STRUCTURE; THERMAL EFFECTS; THERMOOXIDATION;

GERMANIUM DIMERS;

SILICON;

EID: 0031143670 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/S0039-6028(97)00017-4 Document Type: Article

Times cited : (14)

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