In-situ X-ray reflectivity investigation of growth and surface morphology evolution during Fe chemical vapor deposition on Si(001)

Surface Science

Volumn 375, Issue 2-3, 1997, Pages 331-339

  Kellerman, B K ^a   Chason, E ^a   Adams, D P ^a   Mayer, T M ^a   White, J M ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Chemical vapor deposition; Iron; Low index single crystal surfaces; Metal semiconductor interfaces; Nucleation; Silicon; Surface roughening; Surface structure, morphology, roughness, and topography; X ray scattering, diffraction, and reflection

Indexed keywords

ACTIVATION ENERGY; FILM GROWTH; HIGH TEMPERATURE EFFECTS; INTERFACES (MATERIALS); IRON; MATHEMATICAL MODELS; PYROLYSIS; REACTION KINETICS; SEMICONDUCTING SILICON; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; X RAY DIFFRACTION ANALYSIS;

AUTOCATALYTIC GROWTH EFFECT; NUCLEATION THEORY; X RAY REFLECTION; X RAY REFLECTIVITY (XRR); X RAY SCATTERING;

CHEMICAL VAPOR DEPOSITION;

EID: 0031124180     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0039-6028(96)01267-8     Document Type: Article

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