A complete plasma physics, plasma chemistry, and surface chemistry simulator used for deposition and etching of thin films

Vide: Science, Technique et Applications

Volumn 53, Issue 284 SUPPL. 1, 1997, Pages 166-171

  Gogolides, Evangelos ^a   Vauvert, Philippe ^a   Turban, Guy ^b  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CONVERGENCE OF NUMERICAL METHODS; DEPOSITION; DIAMOND FILMS; FLUOROCARBONS; ITERATIVE METHODS; MATHEMATICAL MODELS; METHANE; PLASMA ETCHING; SILICA; SYNTHESIS (CHEMICAL); THIN FILMS;

RADIO FREQUENCY PLASMAS;

PLASMA SIMULATION;

EID: 0031117286     PISSN: 12660167     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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