Planarization of rough silicon surfaces by laser annealing

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 473-476

  Bosseboeuf, A ^a   Boulmer, J ^a   Debarre D ^a  

^a CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH FROM MELT; EPITAXIAL GROWTH; EXCIMER LASERS; MELTING; MICROMACHINING; SURFACE ROUGHNESS;

LASER ANNEALING; PLANARIZATION;

SILICON ALLOYS;

EID: 0031077944     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00922-1     Document Type: Article

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