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Volumn 10, Issue 1, 1997, Pages 17-23

Limited yield estimation for visual defect sources

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL DEFECTS; ERRORS; INSPECTION; MATERIALS TESTING; PARAMETER ESTIMATION; SEMICONDUCTOR MATERIALS;

EID: 0031077148     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.554478     Document Type: Article
Times cited : (31)

References (20)
  • 2
    • 84938162176 scopus 로고
    • Cost-size optima of monolithic integrated circuits
    • Dec.
    • B. T. Murphy, "Cost-size optima of monolithic integrated circuits," Proc. IEEE, vol. 52, pp. 1537-1545, Dec. 1964.
    • (1964) Proc. IEEE , vol.52 , pp. 1537-1545
    • Murphy, B.T.1
  • 3
    • 33748132575 scopus 로고
    • University of Vermont, Burlington, unpublished course notes
    • C. H. Stapper, "Integrated circuit yield statistics," University of Vermont, Burlington, unpublished course notes, 1993, pp. 91-92.
    • (1993) Integrated Circuit Yield Statistics , pp. 91-92
    • Stapper, C.H.1
  • 4
    • 0026128879 scopus 로고
    • Statistics associated with spatial fault simulation used for evaluating integrated circuit yield enhancement
    • Mar.
    • _, "Statistics associated with spatial fault simulation used for evaluating integrated circuit yield enhancement," IEEE Trans. Computer-Aided Design, vol. 10, pp. 399-406, Mar. 1991.
    • (1991) IEEE Trans. Computer-Aided Design , vol.10 , pp. 399-406
  • 5
    • 0027700469 scopus 로고
    • The yield models and defect density monitors for integrated circuit diagnosis
    • Nov.
    • R. K. Nahar, "The yield models and defect density monitors for integrated circuit diagnosis," Microelectron. Reliab., vol. 33, pp. 2153-2159, Nov. 1993.
    • (1993) Microelectron. Reliab. , vol.33 , pp. 2153-2159
    • Nahar, R.K.1
  • 6
    • 0020087799 scopus 로고
    • Experimental analysis and new modeling of MOS LSI yield associated with the number of elements
    • Feb.
    • K. Saito and E. Arai, "Experimental analysis and new modeling of MOS LSI yield associated with the number of elements," IEEE J. Solid-State Circuits, vol. SC-17, pp. 28-33, Feb. 1982.
    • (1982) IEEE J. Solid-State Circuits , vol.SC-17 , pp. 28-33
    • Saito, K.1    Arai, E.2
  • 7
    • 0020846899 scopus 로고
    • Modeling of integrated circuit defect sensitivities
    • Nov.
    • C. H. Stapper, "Modeling of integrated circuit defect sensitivities," IBM J. Res. Develop., vol. 27, pp. 549-557, Nov. 1983.
    • (1983) IBM J. Res. Develop. , vol.27 , pp. 549-557
    • Stapper, C.H.1
  • 8
    • 0021466353 scopus 로고
    • Modeling of defects in integrated circuit photolithographic patterns
    • July
    • _, "Modeling of defects in integrated circuit photolithographic patterns," IBM J. Res. Develop., vol. 28, pp. 461-475, July 1984.
    • (1984) IBM J. Res. Develop. , vol.28 , pp. 461-475
  • 9
    • 0026256670 scopus 로고
    • The parametric yield enhancement of integrated circuits
    • Nov.-Dec.
    • M. Singha and R. Spence, "The parametric yield enhancement of integrated circuits," Int. J. Circuit Theory Appl., vol. 19, pp. 565-578, Nov.-Dec. 1991.
    • (1991) Int. J. Circuit Theory Appl. , vol.19 , pp. 565-578
    • Singha, M.1    Spence, R.2
  • 10
    • 0026866966 scopus 로고
    • Prediction of product yield distributions from wafer parametric measurements of CMOS Circuits
    • May
    • L. Mizrukhin, J. Heuy, and S. Mehta, "Prediction of product yield distributions from wafer parametric measurements of CMOS Circuits," IEEE Trans. Semicond. Manufact., vol. 5, pp. 88-93, May 1992.
    • (1992) IEEE Trans. Semicond. Manufact. , vol.5 , pp. 88-93
    • Mizrukhin, L.1    Heuy, J.2    Mehta, S.3
  • 11
    • 0004744726 scopus 로고
    • LSI yield modeling and process monitoring
    • May
    • C. H. Stapper, "LSI yield modeling and process monitoring," IBM J. Res. Develop., pp. 228-234, May 1976.
    • (1976) IBM J. Res. Develop. , pp. 228-234
    • Stapper, C.H.1
  • 12
    • 0025902891 scopus 로고
    • Utilizing an integrated yield management system to improve return on investment in IC manufacturing
    • May
    • P. Castrucci, G. Dickerson, and D. Bakker, "Utilizing an integrated yield management system to improve return on investment in IC manufacturing," in 1991 IEEE/SEMI Int. Semiconductor Science Symp., May 1991, pp. 25-29.
    • (1991) 1991 IEEE/SEMI Int. Semiconductor Science Symp. , pp. 25-29
    • Castrucci, P.1    Dickerson, G.2    Bakker, D.3
  • 16
    • 0027634898 scopus 로고
    • Obtaining process data from defect-detection information to improve device yield
    • July
    • P. Gabella and E. Knowles, "Obtaining process data from defect-detection information to improve device yield," Microcontamination, pp. 41-45, July 1993.
    • (1993) Microcontamination , pp. 41-45
    • Gabella, P.1    Knowles, E.2
  • 17
    • 33748207351 scopus 로고
    • Defect metrology in Fab25
    • Oct.
    • A. Berezin, "Defect metrology in Fab25," presented at the KLA Yield Management Seminar, Oct. 1995, p. 10.
    • (1995) KLA Yield Management Seminar , pp. 10
    • Berezin, A.1
  • 18
    • 33748346629 scopus 로고
    • Determining yield loss using in-line defect inspection results
    • Mar.
    • M. G. McIntyre, "Determining yield loss using in-line defect inspection results," presented at the KLA Yield Management Seminar, Mar. 1994.
    • (1994) KLA Yield Management Seminar
    • McIntyre, M.G.1
  • 19
    • 0020735104 scopus 로고
    • Integrated Circuit Yield Statistics
    • Apr.
    • C. H. Stapper, F. M. Armstrong, and K. Saji, "Integrated Circuit Yield Statistics," Proc. IEEE, vol. 71, pp. 453-468, Apr. 1983.
    • (1983) Proc. IEEE , vol.71 , pp. 453-468
    • Stapper, C.H.1    Armstrong, F.M.2    Saji, K.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.