Photoemission monitored cleaning of pure and implanted tungsten photocathodes by picosecond UV laser

Applied Surface Science

Volumn 109-110, Issue , 1997, Pages 509-513

  Tomas, C ^a   Girardeau Montaut, J P ^a   Afif, M ^a   Romand, M ^a   Charbonnier, M ^a   Girardeau Montaut, C ^a  

^a UNIVERSITÉ LYON 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ELECTRIC CURRENT MEASUREMENT; ELECTRON EMISSION; LASER APPLICATIONS; OXIDES; PHOTOCATHODES; PHOTOEMISSION; TUNGSTEN;

PICOSECOND ULTRAVIOLET LASER CLEANING;

SURFACE CLEANING;

EID: 0031076364     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00797-0     Document Type: Article

References (8)

1. E. Bauer, H. Poppa and Y. Viswanath, Surf. Sci. 58 (1976) 517.
2. Y.F. Lu, M. Takai, S. Komuro, T. Shiokawa and Y. Aoyagi, Appl. Phys. A 59 (1994) 281.
3. M. Afif, J.P. Girardeau-Montaut, C. Tomas, M. Romand, M. Charbonnier, N.S. Prakash, A. Perez, G. Marest and J.M. Frigerio, Appl. Surf. Sci. 96-98 (1996) 469.
4. G.D. Rieck, Tungsten and its Compounds (Pergamon, New York, 1967).
5. V.S. Fomenko, Handbook of Thermoionic Properties, Ed. G.V. Samsonov (Plenum, New York) p. 53, and references therein.
6. J.P. Girardeau-Montaut and C. Girardeau-Montaut, J. Appl. Phys. 65 (1989) 2889.
7. J.P. Girardeau-Montaut, Phys. Rev. B 54 (1996) 4511.
8. M. Pons, A. Galerie and M. Caillet, Defect Diffusion Forum 57/58 (1988) p. 189.